The next deadline for submissions is March 15, 2010. These applications will be considered for 3 month residencies beginning in September 2010 and January 2011. Click here for more information.
Prospective Recess residents will undergo a rigorous application process, submitting a resume, artists’ statement, a letter of recommendation, and ten jpeg images/video representations or other ephemera, characterizing work created in the past two years. In addition, artists should include a statement of purpose that includes a description of the artist’s particular interest in the Recess Program, and a detailed proposal of a specific project the artist will develop during his or her residency.